A process for electroless deposition of NiP films on a transparent non-conductive soda lime glass is investigated. The process requires at least two repetitive cycles of etching and activation. The annealing process of the NiP films at 400 and 600˚C has been studied and the optimal heat treatment condition has been established. Different Ni bath with different pH has been employed to assess the NiP deposition. Characterization of the deposits by optical and scanning electron microscopy has provided information on the nature of crystallites and on the surface topography.